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Equipment’s for Semiconductor

Fully Automatic Wet Bench Machine

The system uses a single-axis horizontal left-right Transmission

Wafer Cleaning Machine WPC240 and 340

Two-fluid spray cleaning——-High-speed centrifugal dewatering

CMOS Cleaning Machine CPC600

LCD, VCM , CCD surface Particle and dust cleaning

Centrifugal cleaning machine Xpower 100

Can do cleaning with whole magazine. Saving loading and unloading time